Cleaning
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Rapid Thermal Process
· Ultra High Reliability
· Small Footprint
· One or Two Spin Modules
· Color LCD Touchscreen
· Unlimited Process Storage Capabilities
· Remote Data Collection and Control
· Stacked Thermal Modules
· Multiple Size Substrates without Change
· Servo Motion Control
· Process Substrates up to 300 mm
· Proven Modular Design
· Lowest Cost of Ownership
S-Cubed System Features:
S-Cubed is a Leading Supplier of Photoresist Process and Cleaning Equipment.  The S-Cubed Engineering team is comprised of  accomplished engineers and entrepreneurs with a long history of designing and manufacturing innovative equipment for the semiconductor and allied industries.
Cyclone
Wafer and Photomask Cleaner
CycloneTM
High Pressure Wafer and Photomask Cleaner
Ideal for cleaning after dicing operations or for mask cleaning.
Available Features Include:
• PC Control for Unlimited Programming, Storage, and Reporting
• Color LCD Touch Screen Graphic User Interface (GUI)
• Capable of Processing up to 12-inch Diameter Substrates
• Spin Chucks for 4” x 4” to 9” x 9” Photomasks
• Brushless DC Spin Motor
• Two Dispense Arm Capability
• Arm Speed and Positioning Fully Programmable
• Fully Programmable Oscillating High Pressure D.I. Water Jet
• High Pressure Adjustable to 2,000 PSI with 0.2um Filtration
• Deployable Crimped Nylon Brush Assembly (3 mil. or 5 mil.)
   with Programmable Rotational Speed, Brush Pressure, and
   Oscillation; Low Pressure D.I. Water Spray on Brush
• D.I. Water and Nitrogen Backside Rinses
• Radially Exhausted Process Chamber
• Materials Compatible with Photoresist Strippers
PRC 6625TM
Back Side Reticle Cleaner

The PRC 6625™ (patent pending) provides a means of cleaning the back side of a Pellicilized Reticle without
affecting nor even touching the Pellicilized side of the reticle.

The specially designed handling means coupled with an innovative capture chuck enables the cleaning of the back
to remove unwanted haze and particles. The tool typically handles the reticles from a SMIF pod and returns the
cleaned reticle to the SMIF pod.

The use of the S-Cubed PRC 6625 will substantially reduce reticle set costs by providing means for a fab to clean
their reticles without having to resort to sending the reticles out for pellicle demount, clean and remount.
PRC 6625
Back Side Reticle Cleaner
PRC 6625 Features
·   Mask handling is only at points on the edge
·   Pellicle does not need to be removed
·   Clears haze
·   Remove organic and particulate contamination
·   Self-contained Class I environment when used with a SMIF pod
       
CWI Technical Sales  ·  Phone: 732-536-3964  ·  Fax: 732-536-0495  ·