OAI's commitment to long-term customer relationships is demonstrated by OAI's focus on engineering, service, and customer support. With over 35 years of experience, and thousands of systems in use around the world, the company has earned a reputation for exceptional products, favorable pricing, and superior customer support. OAI products deliver outstanding performance, exceptional versatility, and proven reliability.
Model 200 and 200IR
Bench top Front and Backside Mask Aligner
- Accurate alignments to 1 micron
- Up to 9" x 9" Mask
- Accommodates a wide variety of substrates and masks
- Backside mask alignment of IR transparent wafers with
  up to 3-5 micron accuracy
- Highly collimtaed, uniform UV light (up to 8" square)
- Quickly change the UV light wavelength
- Exposure controlled intensity to +/-2%
- Can be configured as Nano Imprint tool
S-Cubed Photoresist
Spin Processing Systems
Camtek Gannet
Automated Optical
Inspection System
Photolithography
Model 800 Optical Frontside/Backside Aligner
Model 800FSA
Semi-Automated, Optical Frontside Mask Aligner
- 1 to 2 micron alignment accuracy
- Up to 9" x 9" Mask
- Accommodates a wide variety of substrates and masks
- Available with light sources up to 2KW power range
- Highly collimtaed, uniform UV light (up to 8" square)
- Motorized Auto Leveling and Auto Gap Setting
- Can be configured as Nano Imprint tool
Model 800MBA
Four Camera, Manual, Optical Backside Mask Aligner
- Sub-micron level to level alignment
- Up to 9" x 9" Mask
- Up to 8" square substrate
- Interchangeable mask holders & chucks
- User-defined and controlled, substrate to mask pressure
- Non-contact, soft-contact and soft-through-hard vacuum
  contact compability
- High efficiency, uniform exposure system
- Can be configured as Nano Imprint tool
Model 5000
Frontside, Automated Submicron Mask Aligner
- Sub-micron level to level alignment
- Up to 14" x 14" Mask
- 50mm to 300mm substrates
- Near UV, Mid UV and Deep UV capability
- Automated robotic wafer handling
- Interchangeable mask and substrate holders
- High efficiency, uniform exposure system
- Non-contact prealignment
- Dual focus for thick photoresist
Model 8000
Automated Frontside, Backside Submicron Mask Aligner
- Sub-micron level to level alignment
- Up to 14" x 14" Mask
- 50mm to 300mm substrates
- Near UV, Mid UV and Deep UV capability
- Automated robotic wafer handling
- Interchangeable mask and substrate holders
- High efficiency, uniform exposure system
- Non-contact prealignment
- Dual focus for thick photoresist
Model 600
Large Substrate Mask Aligner
- Sub-micron level to level alignment
- Up to 14" x 14" Mask
- 50mm to 300mm substrates
- Near UV, Mid UV and Deep UV capability
- Automated robotic wafer handling
- Interchangeable mask and substrate holders
- High efficiency, uniform exposure system
- Non-contact prealignment
- Dual focus for thick photoresist
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CWI Technical Sales    Phone: 732-536-3964    Fax: 732-536-0495   

Amicra AFC Fully-Automated Die Bonder
0.5um Accuracy
OAI AML
Wafer Bonder